Understanding Hyperlith Tutorial 8 Barc Optimization With Standing Wave Metric
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Detailed Analysis of Hyperlith Tutorial 8 Barc Optimization With Standing Wave Metric
The OPC and source A 32nm line is simulated at five different pitches. At each pitch a bias is sought to cause the line to print at 32nm.
00:00 Intro - Amplitude can be expressed with three parameters 00:32 Peak-to-peak (top value) 01:07 0-peak value 01:35 RMS.
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